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Abstract

A method for forming an array of M.times.N thin film actuated mirrors for use in an optical projection system comprises the steps of: (a) forming a sacrificial layer on top of an active matrix; (b) forming an array of M.times.N supporting members on the sacrificial layer; (c) depositing an elastic layer; (d) forming M.times.N conduits; (e) depositing a second thin film layer; (f) forming an electrodisplacive layer; (g) patterning the elastic layer, the second layer and the electrodisplacive layer to form an array of M.times.N semifinished actuated mirror structures; (h) heat treating the array of M.times.N semifinished actuated mirror structures; (i) depositing a first thin film layer on each of the semifinished actuated mirror structures to form an array of M.times.N actuated mirror structures; (j) covering each of the actuated mirror structures with a protection layer; and (k) removing the protection layer and the sacrificial layer to thereby form said array of M.times.N thin film actuated mirrors.

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First Claim