Dual-axis plasma imaging system for use in spectroscopic analysis

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United States of America Patent

PATENT NO 5642190
SERIAL NO

08522755

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Abstract

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A dual-axis plasma imaging system for use in spectroscopic analysis of material. The system includes a plasma torch having a tubular member with an upstream inlet end for receiving a flow of material to be analyzed and a downstream end for discharge of the material. An induction coil is provided for effecting plasma optical emission from the material, and a spectrometer for analyzing the emission. A first optical imaging device collects and focuses an axial emission component onto a primary aperture of the spectrometer. The first device is in a principal optical path between the tubular member and the spectrometer. A second optical imaging device in a secondary optical path collects and focuses a radial emission component onto the primary aperture of the spectrometer. The secondary path is angularly offset from the principal path. A folding mirror in the principal optical path, when in a stowed position, permits the first device to collect and focus the axial emission component onto the primary aperture. In an operative position, the mirror permits the second device to collect and focus the radial emission component onto the primary aperture. A system is provided for communicating the radial emission component to the folding mirror.

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Patent Owner(s)

Patent OwnerAddress
KRUPA ROBERT JTHERMO JARRELL ASH CORP 8 E FORGE PARKWAY FRANKLIN MA 02038

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Krupa, Robert J Leominster, MA 29 1993
Owen, Edward E Nashua, NH 4 40

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