Stabilizing support mechanism for electron beam apparatus
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United States of America Patent
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-
Jul 1, 1997
Grant Date -
N/A
app pub date -
Mar 4, 1996
filing date -
Mar 4, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An electron beam apparatus is provided with a support mechanism upon which X and Y axis interferometers are mounted within a vacuum chamber. By employing a flat ring of a low coefficient of thermal expansion glass ceramic composition affixed beneath the chamber upper wall and to which the interferometers are mounted, the normal extremes of vacuum and heat as existing within the chamber are resisted to insure of a fixed horizontal alignment of the beams as projected by the interferometers during operation of the apparatus. Flexure mounts are included for the interferometer ring together with a magnetic shield disposed adjacent the ring undersurface. Stability of workpieces is further enhanced by the use of the same glass ceramic composition in the formation of the carrier and its reference plate of the apparatus.
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