Thin film transistor

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United States of America Patent

PATENT NO 5644146
SERIAL NO

08407856

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Abstract

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A thin film transistor comprises a dielectric substrate (1), a semiconductor layer (3) of poly-crystalline silicon layer having a drain region (8), an active gate region (4, 8-0), and a source region (7) placed on said substrate (1), a drain terminal (10) and a source terminal (10A) connected to said respective regions for external connection, a gate electrode (6) coupled with a part of said gate region (4) through a dielectric layer (4A), wherein length (d) of said gate electrode (6) is shorter than the length of gate region (4 plus 8-0), so that an offset region (8-0), where no gate electrode faces with said gate region, is produced.

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Patent Owner(s)

Patent OwnerAddress
TDK CORPORATION13-1 NIHONBASHI 1-CHOME CHUO-KU TOKYO
SEMICONDUCTOR ENERGY LABORATORY CO LTDATSUGI-SHI KANAGAWA-KEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arai, Michio Tokyo, JP 149 4105
Codama, Mitsufumi Kanagawa, JP 37 1300
Takayama, Ichiro Kanagawa, JP 21 387

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