Dual cylindrical target magnetron with multiple anodes
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United States of America Patent
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Jul 8, 1997
Issued Date -
N/A
app pub date -
Jun 21, 1996
filing date -
Sep 6, 1994
priority date (Note) -
Expired
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Abstract
Two adjacent rotating cylindrical targets are used in a specific form of a vacuum sputtering system to deposit a film of material onto a substrate. Elongated anodes are provided on opposite sides and in between the targets in a manner to make more uniform the rate of deposition across the substrate.
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