Process for adjusting the sensitivity to radiation of photopolymerizable compositions
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United States of America Patent
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Jul 8, 1997
Issued Date -
N/A
app pub date -
Jan 29, 1996
filing date -
Oct 27, 1989
priority date (Note) -
Expired
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Abstract
A process is described for the preparation of photopolymerizable compositions, wherein the photopolymerizable compositions can be photopolymerized by the irradiation of emission lines of differing wavelength from a UV/VIS laser light source, and contain a photopolymerizable compound and at least two photoinitiators, by adjusting the sensitivity to radiation. The ratio between the concentrations of the individual photoinitiators is so adjusted that the composition has virtually the same optical density for the radiation of the different emission lines at which the photoinitiators are effective.
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