Photoresist stripping composition
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United States of America Patent
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Jul 15, 1997
Grant Date -
N/A
app pub date -
Jan 23, 1996
filing date -
Jan 23, 1996
priority date (Note) -
Expired
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Abstract
A photoresist stripping composition containing: (a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5; (b) 70-20% by weight of alkanolamine compounds; and (c) 0.1-10% by weight of 2,2'[[methyl-1H-benzothiazol-1-yl)methyl]imino]bis-ethanol.
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