Cleaning apparatus for cleaning substrates
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United States of America Patent
Stats
-
Jul 29, 1997
Grant Date -
N/A
app pub date -
Jan 17, 1996
filing date -
Jan 19, 1995
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The cleaning apparatus for cleaning a semiconductor wafer W as a substrate, has a holding mechanism for holding the wafer, a motor for rotating the wafer held by the holding mechanism, and a cleaning section provided on at least one side of the wafer held by the holding mechanism. The cleaning section includes at least one cleaning member provided so as to be brought into contact with the wafer W, and the cleaning member is movable along with the rotation of the substrate rotated by the motor while it is in contact with the wafer.
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