Method of forming coating film and apparatus therefor

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United States of America Patent

PATENT NO 5658615
SERIAL NO

08217636

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Abstract

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An apparatus for forming a coating film, comprises a spin chuck for supporting a substrate with one surface facing upward and rotating the substrate about a vertical axis, a first nozzle for supplying a solvent of a coating solution on the substrate, and a second nozzle for supplying the coating solution on a central portion of the substrate. The first and second nozzles are supported by a head such that the supported nozzle moves between a dropping position above the substrate and a waiting position offset from the substrate. The solvent and coating solution are diffused along the surface of the substrate by rotating the spin chuck.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Deguchi, Masatoshi Kumamoto, JP 28 547
Fujimoto, Akihiro Kumamoto-ken, JP 91 2052
Hasebe, Keizo Kofu, JP 11 951
Iino, Hiroyuki Nirasaki, JP 5 311
Inada, Hiroichi Kumamoto, JP 33 586
Kitamura, Shinzi Kumamoto-ken, JP 6 394
Nambu, Mitsuhiro Kumamoto-ken, JP 3 251

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