All-polymeric phase shift masks
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United States of America Patent
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Sep 2, 1997
Issued Date -
N/A
app pub date -
Jun 2, 1995
filing date -
Mar 8, 1994
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An embodiment of the present invention is a process in which a polymer solution is spin coated onto a master data recording disk, such as glass substrate with photoresist images, before separating. After drying and forming polymer, a polymer membrane results which is a faithful reproduction of micron-sized optical recording features on the surface of the master. Such membrane is either peeled-off and mounted to a pellicle-like frame or first laminated to a stiffer, stronger substrate before peeling to support the duplicate.
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