Light-sensitive resin composition

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5663212
SERIAL NO

08191927

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A light-sensitive resin composition which can be developed in an alkaline aqueous solution and has an excellent image-forming performance and a sufficient UV absorbance after an image formation is disclosed. The light-sensitive resin composition includes (1) a photopolymerization initiator or a photopolymerization initiator system, (2) an addition-polymerizable monomer having an ethylenically unsaturated double bond, (3) a high molecular binder which is soluble in an alkaline aqueous solution and insoluble in water, and (4) at least one of the compounds which substantially do not absorb light in a specified UV region and which, when subjected to treatment with an aqueous alkali solution and/or to heating, are capable of absorbing light in that region and have substantially no absorption in the visible region.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATION26-30 NISHIAZABU 2-CHOME MINATO-KU TOKYO 1068620

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fukushige, Yuuichi Shizuoka, JP 38 250
Iwakura, Ken Shizuoka, JP 85 503
Sato, Morimasa Shizuoka, JP 40 329
Wakata, Yuichi Shizuoka, JP 32 270

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation