Plasma treatment apparatus having a workpiece-side electrode grounding circuit
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United States of America Patent
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Sep 9, 1997
Grant Date -
N/A
app pub date -
Feb 14, 1994
filing date -
Feb 16, 1993
priority date (Note) -
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Abstract
A static chuck and a workpiece push-up pin are disposed on a susceptor which is one of opposed electrodes generating plasma. The push-up pin and the susceptor are electrically connected. A grounding circuit which discharges electric charges remaining on the susceptor is disposed in parallel with an RF power supply circuit which supplies RF power to the susceptor. Thus, electric charges remaining in the power supply circuit can be discharged and an abnormal discharging between the push-up pin and the susceptor can be prevented.
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