Method of cleaning substrate
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United States of America Patent
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Oct 21, 1997
Grant Date -
N/A
app pub date -
Mar 6, 1996
filing date -
Mar 27, 1995
priority date (Note) -
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Abstract
A method of cleaning the surface of a substrate, wherein the first step of the process of cleaning the substrate including a step of cleaning the surface of the substrate by an acidic solution, oxidizing solution, or alkaline solution, comprises a step of removing the natural oxide film formed on the surface of the substrate.
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