Mo adsorbent for .sup.99 Mo-.sup.99m Tc generators and manufacturing thereof
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United States of America Patent
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Oct 28, 1997
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app pub date -
May 20, 1996
filing date -
May 22, 1995
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Abstract
Mo adsorbent for .sup.99 Mo-.sup.99m Tc generators has a skeleton structure having mainly repeating units represented by the general formula; ##STR1## wherein X is a halogen atom or alkoxide group having one to six carbon atoms, 10% or more of X is halogen, R is an alkylene, polymethylene, or carbon chain having unsaturated bond, repeating unit (D) is bonded to any one of repeating units (A), (B), and (C), the branch structure is controlled by the content of repeating units (A), (B), and (C), the adsorbent is insoluble in water and adsorbs selectively only Mo from an aqueous solution containing Mo, and elutes .sup.99m Tc generated from a radioactive isotope .sup.99 Mo. This Mo adsorbent uses .sup.99 Mo obtained from natural Mo by (n, .gamma.) method, therefore, a generator having the same size as conventional .sup.99m Tc generators is realized.
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