Sulfur-based amides and bis-amides useful against skin disorders

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United States of America Patent

PATENT NO 5683705
SERIAL NO

08626769

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Abstract

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Novel sulfhydryl group-containing amides and disulfide group-containing bis-amides useful for treating or preventing an abnormal biological condition or a disease, and/or improving the texture or appearance of the skin, as well as compositions containing amides and bis-amides and methods for their use are described. Such types of abnormal biological conditions or diseases include skin atrophy, i.e., the thinning and/or general degradation of the dermis often characterized by a decrease in collagen and/or elastin as well as decreased number, size and doubling potential of fibroblast cells, and other maladies including, but are not limited to dry skin, severe dry skin, dandruff, acne, keratoses, psoriasis, eczema, skin flakiness, pruritus, age spots, lentigines, melasmas, wrinkles, warts, blemished skin, hyperpigmented skin, hyperkeratotic skin, inflammatory dermatoses, age-related skin changes and skin in need of cleansers.

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Patent Owner(s)

Patent OwnerAddress
ESTEE LAUDER INCA CORPORATION OF NEW YORK 767 FIFTH AVENUE NEW YORK NY 10153

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Knight, Althea Teaneck, NJ 3 19
Maes, Daniel H Huntington, NY 57 638
Zecchino, Jules Closter, NJ 10 135

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