Process for depositing barrier film on three-dimensional articles
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United States of America Patent
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Nov 25, 1997
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N/A
app pub date -
Sep 30, 1996
filing date -
Sep 30, 1996
priority date (Note) -
Expired
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Abstract
The invention relates to a Plasma Enhanced Chemical Vapor Deposition (PECVD) process whereby a coating of inorganic material is deposited on three-dimensional articles, including low melting temperature polymer articles. The coating possesses excellent gas and/or water vapor barrier properties.
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