Arc discharge plasma CVD method for forming diamond-like carbon films
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United States of America Patent
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Nov 25, 1997
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Oct 18, 1994
filing date -
Oct 19, 1993
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Abstract
A method of forming a diamond-like carbon film on a substrate arranged in a vacuum chamber includes the steps of generating an arc-discharge plasma current in the vacuum chamber, supplying a reaction gas containing carbon atoms, such as CH.sub.4 gas for example, into the arc-discharge plasma current, applying a high-frequency voltage to the substrate so that a self-bias developed in the substrate is not more than -200 V, and forming a diamond-like carbon film from the reaction gas on the substrate that is supplied with the high-frequency voltage.
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