High absorbance/low reflectance felts with a pattern layer
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United States of America Patent
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Dec 2, 1997
Grant Date -
N/A
app pub date -
Apr 30, 1996
filing date -
Apr 30, 1996
priority date (Note) -
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status (Latency Note)
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Abstract
An apparatus for making paper. The apparatus comprises a felt and a pattern layer joined to the felt. The felt has a relatively high UV absorbance. Such a high UV absorbance prevents the actinic radiation applied to cure the pattern layer from scattering when the radiation penetrates the surface of the pattern layer. By limiting the scattering of radiation beneath the surface of the pattern layer, extraneous cured pattern layer material is minimized in the regions of the felt where it is desired not to have pattern layer material.
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