Illuminating optical system for use in projecting exposure device
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United States of America Patent
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Dec 9, 1997
Grant Date -
N/A
app pub date -
Mar 23, 1995
filing date -
Mar 23, 1994
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An illuminating optical system for use in a projection exposure device with high utilization efficiency of the light from the light source and capable of easily realizing with simple construction is disclosed. The system comprises a light source, a light flux separating optical system for separating a light flux from the light source, a condenser optical system for leading the light flux separated by the light flux separating optical system on a reticle, and a diffraction optical unit included in the light flux separating optical system and having a linear grating pattern for separating the light flux from the light source into four.
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