Use of cobalt tungsten phosphide as a barrier material for copper metallization

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Dec 9, 1997
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Nov 20, 1996
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Nov 20, 1996

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Abstract

A technique for electrolessly depositing a CoWP barrier material on to copper and electrolessly depositing copper onto a CoWP barrier material to prevent copper diffusion when forming layers and/or structures on a semiconductor wafer.

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Patent Owner	Address
CORNELL RESEARCH FOUNDATION INC (NY CORP )	SUITE 105 20 THORNWOOD DRIVE ITHACA NY 14850

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B05D:PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MAT....

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Inventor Name	Address	# of filed Patents	Total Citations
Dubin, Valery M	Cupertino, CA	120	5339
Schacham-Diamand, Yosi	Ithaca, NY	1	603
Ting, Chiu H	Saratoga, CA	27	3732
Vasudev, Prahalad K	Austin, TX	27	3747
Zhao, Bin	Irvine, CA	405	7112

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Use of cobalt tungsten phosphide as a barrier material for copper metallization

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United States of America Patent

08754600

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SERIAL NO	08754600
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08754600

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