Exposure apparatus and microdevice manufacturing method using the same

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United States of America Patent

PATENT NO 5699148
SERIAL NO

08582895

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Abstract

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A scanning exposure apparatus and method wherein an original and a substrate are moved relative to an illumination region to which pulse light is projected. The apparatus includes a light source for successively emitting pulse light, an optical integrator for receiving the pulse light from the light source, a masking blade having an opening for being projected onto the original in a defocused state, wherein the pulse light from the optical integrator is projected to the illumination region through the opening of the masking blade, and the opening of the masking blade, as projected onto the original in the defocused state, defines on the illumination region a light intensity distribution having a trapezoidal shape with respect to the direction of movement of the original, and a movement controller for controlling movement of the original and the substrate so that the substrate is exposed to the original with the pulse light from the illumination region, during a period in which pulse light, successively emitted by the light source, is projected onto the illumination region.

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Patent Owner(s)

Patent OwnerAddress
CANON KABUSHIKI KAISHATOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shiozawa, Takahisa Utsunomiya, JP 22 860

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