Importance

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Abstract

A dynamic random access memory cell and method of fabrication thereof are disclosed. An access transistor (10) is formed in a substrate (12). The deposition of a first dielectric layer (20) follows. A plurality of conductive layers (22-30) are deposited, with alternating layers (24 and 28) having a higher dopant concentration than the other layers (22, 26 and 30). A contact hole (32) is etched through the conductive layers (22-30) and the first dielectric layer (20) to the substrate (12). A contact layer (36) is then deposited, making contact with the substrate (12) and each conductive layer (22-30). The conductive layers (22-30) and contact layer (36) are patterned with an isotropic etch selective to the higher doped layers (24 and 28). The resulting structure is a conductive member (42) with a peripheral side surface (44) having inset furrows (40) formed by the selective etching of the higher doped layers (24 and 28). A conformal capacitor dielectric (46) is formed over the conductive structure (42). A conductive plate layer (46) is formed over the capacitor dielectric (46).

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First Claim