Cleaning fluid for semiconductor substrate
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United States of America Patent
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Jan 6, 1998
Grant Date -
N/A
app pub date -
Mar 10, 1993
filing date -
Mar 11, 1992
priority date (Note) -
In Force
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Abstract
An acidic or basic hydrogen peroxide cleaning fluid for cleaning a semiconductor substrate, comprising a phosphonic acid chelating agent and a wetting agent, or comprising a wetting agent alone.
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