Performing optical proximity correction with the aid of design rule checkers
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 6, 1998
Grant Date -
N/A
app pub date -
Feb 27, 1996
filing date -
Feb 27, 1996
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method is disclosed for identifying regions of an integrated circuit layout design where optical proximity correction will be most useful and then performing optical proximity correction on those regions only. More specifically, the method includes the following steps: (a) analyzing an integrated circuit layout design with a design role checker to locate features of the integrated circuit layout design meeting predefined criteria; and (b) performing optical proximity correction on the features meeting the criteria in order to generate a reticle design. The criteria employed by the design role checker to select features include outside corners on patterns, inside corners on features, feature size, feature shape, and feature angles.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully