Method of and apparatus for forming film with rotary electrode
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United States of America Patent
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Jan 27, 1998
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N/A
app pub date -
Aug 7, 1996
filing date -
Aug 8, 1995
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Abstract
In a method of and an apparatus for forming a thin film on a substrate, a rotary electrode is provided and rotated so that an electrode surface of the electrode moves and passes by a substrate surface due to the rotation of the electrode. Thereby a reaction gas is supplied into a gap between the substrate surface and the electrode surface. A high-frequency power is applied or dc power to the rotary electrode thereby generating a plasma between the substrate surface and the electrode surface, for forming the thin film by chemical reaction of the reaction gas supplied into the plasma.
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