Projection exposure apparatus and method which uses multiple diffraction gratings in order to produce a solid state device with fine patterns
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United States of America Patent
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Feb 3, 1998
Grant Date -
N/A
app pub date -
May 17, 1996
filing date -
May 19, 1995
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
In exposing and projecting a mask onto a substrate using projection optics, a first grating is provided between the substrate and the projection optics and a second grating is provided between the projection optics and the mask so that the image of the mask pattern is formed near the substrate surface by the interference of beams diffracted by the first grating. This arrangement produces the effect of virtually increasing the NA of the optical system by up to a factor of two, making it possible to manufacture LSIs with fine patterns.
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