Negative type composition for chemically amplified resist and process and apparatus of formation of chemically amplified resist pattern
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United States of America Patent
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Mar 3, 1998
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app pub date -
Oct 23, 1996
filing date -
Jan 7, 1992
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Abstract
A composition for negative type chemically amplified resist including, as main components, a random copolymer of vinyl phenol and vinyl cyclohexanol, a melamine resin having an enhanced hexamethoxymethylmelamine content, an acid generator for generating an acid upon irradiation by ionizing radiation, and a solvent. The resist pattern formation process and apparatus are also disclosed.
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