Shielding for arc suppression in rotating magnetron sputtering systems
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 10, 1998
Grant Date -
N/A
app pub date -
Mar 21, 1995
filing date -
Aug 10, 1990
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A cathode body for a rotating cylindrical magnetron wherein the magnetron provides a sputtering zone extending along the length of the cathode body and circumferentially along a relatively narrow region thereof. The cathode body includes an elongated tubular member having a target material at the outer surface thereof. A collar of electrically-conductive material is located at at least one end of the tubular member, and extends along the tubular member from that one end into the erosion zone. A sleeve of electrically-conductive material may extend circumferentially around the collar.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully