Phase shift mask and method of manufacture
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United States of America Patent
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-
Mar 17, 1998
Grant Date -
N/A
app pub date -
Nov 14, 1994
filing date -
May 13, 1991
priority date (Note) -
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status (Latency Note)
Importance
Abstract
A phase shift mask and method of manufacture are disclosed in which a light shielding layer is formed on a substrate and patterned to produce parallel areas of predetermined intervals and spacings of the desired shape. A phase shift film is formed on the substrate and light shielding layer. The phase shift film is patterned so that remaining portions of the phase shift film fully shield the parallel areas of the light shielding layer.
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