Method for detecting abnormal patterns

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United States of America Patent

PATENT NO 5732121
SERIAL NO

08731001

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Abstract

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Prospective abnormal patterns in a radiation image of an object are detected in accordance with an image signal representing the radiation image. A probability density function of the image signal, which corresponds to a region, that is inward from a contour of each of the prospective abnormal patterns having been detected, and a neighboring region, is formed. Probability density function information in accordance with the probability density function is obtained. A definite prospective abnormal pattern, which is among the prospective abnormal patterns having been detected and has a high level of probability that it will be the true abnormal pattern, is detected in accordance with the probability density function information.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATION26-30 NISHIAZABU 2-CHOME MINATO-KU TOKYO 1068620 ?1068620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nakajima, Nobuyoshi Kanagawa-ken, JP 107 1739
Takeo, Hideya Kanagawa-ken, JP 84 917

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