Vacuum treatment chamber
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United States of America Patent
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Mar 31, 1998
Grant Date -
N/A
app pub date -
Feb 8, 1996
filing date -
Nov 16, 1995
priority date (Note) -
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Abstract
A vacuum treatment chamber has a sputtering electrode and a counter electrode together defining a plasma discharge area. The counter electrode has an electrode surface area which is not visible from the sputtering electrode. A third electrode, together with the non-visible surface area, defines an auxiliary plasma discharge space. A substantially unencumbered propagative electron path is established between the discharge spaces. A plasma discharge is generated between the sputtering electrode and the counter electrode within a vacuum chamber.
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