Localized simulated annealing

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United States of America Patent

PATENT NO 5745735
SERIAL NO

08549405

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Abstract

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According to the present invention, a method of optimization by simulated annealing is provided that uses a spatial metric to localize the simulated annealing temperature, the move set, and the objects which the moves operate on. The method keeps a local history of the optimization process. The localization allows the simulated annealing process to adaptively control the annealing schedule of each local region independently. This allows the annealing temperature, move set, and the objects upon which the move set operates to each be adjusted for each region independently to maximize efficiency. This results in optimization of all regions in a quick and efficient manner.

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Patent Owner(s)

Patent OwnerAddress
INTERNATIONAL BUSINESS MACHINES CORPORATIONNEW ORCHARD ROAD ARMONK NY 10504

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cohn, John Maxwell Richmond, VT 14 158
Hathaway, David James Underhill Center, VT 12 257

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