Multi-zone method for controlling voc and nox emissions in a flatline conveyor wafer drying system

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United States of America Patent

PATENT NO 5749160
SERIAL NO

08660954

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Abstract

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Environmental enhancement by controlling volatile organic compound (VOC) and NO.sub.x emissions in a flatline wafer drying system. The method is characterized by advancing the wafers of the type used in manufacture of oriented strand board (OSB) on a flatline conveyor embodying a plurality of dryer zones. Particularly, heating the dryer zones in successive lower temperatures in the range 500.degree. F. to 200.degree. F. by flowing heated air upwardly through the flatline wafer drying conveyor; removing VOC-rich exhaust air from a primary dryer zone while flowing heated air upwardly therein and removing VOC-rich exhaust air from a secondary dryer zone while flowing heated air from therein.

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Patent Owner(s)

Patent OwnerAddress
GEORGE KOCH SONS INCEVANSVILLE INDIANA 47744

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dexter, Jeffrey L Evansville, IN 4 78
Grebe, Bruce Bemidji, MN 1 5
Head, Larry J Evansville, IN 3 18
Miller, Donald E Evansville, IN 40 385
Nowack, William Twin Lakes, WI 1 5
Siemers, David C Evansville, IN 4 22
Wolff, Daniel Norcross, GA 5 14

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