Gas analysis or leak detection process and device for same
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United States of America Patent
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May 26, 1998
Grant Date -
N/A
app pub date -
Dec 20, 1995
filing date -
Dec 23, 1994
priority date (Note) -
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Abstract
A process and device for gas analysis has an input for a gas analyzer which is meant for connection to a vacuum pump. At least a portion of the gas to be analyzed is supplied at the inlet by applying a pump flux to the inlet. Superimposed on the pump flux is a further gas flux which is supplied over one or more gas line segments at a non-molecular flow-dominant flowrate.
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