Gas exhaust apparatus
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United States of America Patent
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-
Jun 2, 1998
Grant Date -
N/A
app pub date -
Dec 12, 1996
filing date -
Dec 12, 1996
priority date (Note) -
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status (Latency Note)
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Abstract
Improved gas exhaust apparatus of a semiconductor plant for substantially reducing the accumulation of solid substance on the surface of a gas exhaust system is disclosed. The apparatus includes a heating section for providing a thermal chamber, thereby transforming incoming gas and oxygen into solid substance. A barrier section is secured to an inner surface of the heating section for preventing the solid substance from accumulating on the inner surface of the heating section. A scrubbing section attached to the heating section is used to expel the solid substance out of the gas exhaust apparatus.
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