Substrate processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5762745
SERIAL NO

08524522

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Abstract

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A substrate processing apparatus includes a plurality of easily removable processing units including at least a heating unit for heating a substrate and a cooling unit for cooling the substrate, and an outer frame having a plurality of compartments. Each compartment has an opening through which a processing unit may be inserted or removed. The plurality of compartments are arranged vertically. Each compartment has a plurality of first joint members connected to utility lines including those of an electrical system, a control system, and a fluid system. The electrical, control, and fluid systems are necessary for operating the processing units. Each processing unit has a plurality of second joint members connected to the first joint members.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 107-6325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirose, Osamu Kumamoto, JP 59 1098

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