Semiconductor processor with wafer face protection
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United States of America Patent
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Jun 9, 1998
Grant Date -
N/A
app pub date -
Aug 17, 1995
filing date -
Aug 17, 1995
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A semiconductor processing station which utilizes a processing head and processing base which are complementary to enclose a processing chamber. The processing head shown has a rotor with two portions both of which rotate. The rotor has axial movable portions which include a piece holder. The piece holder supports a wafer or other semiconductor piece being processed. The piece holder can be axially extended and retracted relative to a thin membrane which acts as a cover to prevent chemicals from reaching the back side of the wafer during processing.
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