Method of forming patterns in organic coatings films and layers
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United States of America Patent
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Jun 9, 1998
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app pub date -
Dec 19, 1996
filing date -
Dec 19, 1996
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Abstract
Water-free, gaseous sulfur trioxide is used as an agent to form patterns in organic coatings, films, and layers, including photoresists, by etching areas exposed to the agent through an overlying mask or by developing a latent image of the desired pattern using the agent as a dry-developer.
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