Method of an apparatus for forming film on substrate by sensing atmospheric pressure
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United States of America Patent
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Jun 16, 1998
Grant Date -
N/A
app pub date -
Apr 17, 1996
filing date -
Apr 21, 1995
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A cup with a top opening is disposed in an open-air space, and an atmospheric pressure sensor is disposed externally to the cup. A CPU calculates a control value which compensates for a variation in the thickness of a coating film which is formed on a surface of a substrate, based on an atmospheric pressure value which is measured by the atmospheric pressure sensor. An air-conditioner is controlled in accordance with the control value, whereby the temperature and the humidity of clean air which is supplied around the cup are adjusted and the variation in the thickness of the coating film is prevented without laborious work.
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