Method of producing structured inorganic layers

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United States of America Patent

PATENT NO 5766680
SERIAL NO

08737340

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Abstract

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Structured inorganic layers are produced by optionally mixing a composition which is obtainable by hydrolysis and polycondensation of (A) at least one hydrolyzable silane of general formula (I) SiX.sub.4 (I) wherein the radicals X are identical or different and represent hydrolyzable groups or hydroxyl groups, or an oligomer derived therefrom, and (B) at least one organosilane of general formula (II) R.sup.1.sub.a R.sup.2.sub.b SiX.sub.(4-a-b) (II) wherein R.sup.1 is a non-hydrolyzable group, R.sup.2 represents a radical carrying a functional group, X has the meaning specified above, and a and b are 0, 1, 2 or 3, the sum (a+b) being 1, 2 or 3, or an oligomer derived therefrom, in a ratio of amount of substance (A):(B) of 5-50:50-95, as well as (C) optionally, one or more compounds of glass- or ceramic forming elements, with a fine-scaled filler, applying the resulting composition onto a substrate, structuring the applied composition and thermally densifying the structured coating to form a structured layer.

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Patent Owner(s)

Patent OwnerAddress
INSTITUT FUER NEUE MATERIALIEN GEMEINNUETZIGE GMBHSAARBRUCKEN FEDERAL REPUBLIC OF GERMANY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Krug, Herbert Puttlingen, DE 28 525
Mennig, Martin Quierschied, DE 56 1535
Schmidt, Helmut Saarbrucken, DE 214 4455

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