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Abstract

Donor elements, assemblages, and associated processes are described for use in a laser-induced thermal transfer process, said elements comprising in the order listed (a) at least one flexible ejection layer comprising a first polymer having a decomposition temperature T.sub.1 and characteristic glass transition temperatures of T.sub.g.sup.0 and T.sub.g.sup.1 for unplasticized and plasticized polymer samples, respectively, wherein the tensile modulus of the flexible ejection layer(s) structure is less than or equal to 2.5 Gigapascals; (b) at least one heating layer; (c) at least one transfer layer comprising (i) a second polymer having a decomposition temperature T.sub.2, wherein T.sub.2 .gtoreq.(T.sub.1 +100.degree. C.) and (ii) an imageable component, with the proviso in some embodiments that an inflexible support substrate is absent in the donor element at least during the thermal transfer process or in other embodiments that a support is absent in the donor element at least during the thermal transfer process. These donor elements are useful in proofing and lithographic printing applications. Assemblages made with these donor elements are useful for fabrication of photomasks on various photohardenable materials, including flexographic printing plates and photoresists. These photomasks are useful in creating a relief image with a photosensitive element, such as flexographic printing plate or a photoresist.

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First Claim