Composition and method for polishing a composite comprising titanium
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United States of America Patent
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Jun 23, 1998
Grant Date -
N/A
app pub date -
Jul 8, 1997
filing date -
Jul 8, 1997
priority date (Note) -
Expired
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Abstract
Aqueous slurries are provided, which are useful for the chemical-mechanical polishing of substrates comprising titanium, comprising: water, submicron abrasive particles, an oxidizing agent, and a mono-, di-, or tri-substituted phenol wherein at least one of the substituted functional groups is polar. Optionally the compositions may also comprise a compound to suppress the rate of removal of silica. The slurries are useful on substrates which also comprise tungsten, aluminum or copper.
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