Method for automatically generating a chenille filled emproidery stitch pattern

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United States of America Patent

PATENT NO 5771173
SERIAL NO

08703527

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention is an improved method for automatically generating chenille filled embroidery stitch patterns and/or claim stitching in a computer aided design system in which the shape to be filled is a complex polygon. Concentric polygons are constructed, such as either by using the medial axis of the polygon or by constructing offset elements and joining arcs without use of the medial axis, and sorted, and spirals are placed along the polygons with stitches being placed along the spirals. For chain stitching, rather than placing spirals, the chain stitches are placed on the perimeter of the concentric polygons.

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Patent Owner(s)

Patent OwnerAddress
PULSE MICROSYSTEMS LTDMISSISSAUGA ONTARIO L5N 6M6

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chia, Jr Benito Mississauga, CA 3 31
Divinsky, Aaron Martin Mississauga, CA 2 26
Goldberg, Brian J Thornhill, CA 10 156
Mayya, Niranjan Mississauga, CA 12 218
Nicolaou, Alexander Mississauga, CA 25 409
Tsonis, Anastasios Conestogo, CA 14 224

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