Method to prevent adhesion of micromechanical structures
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United States of America Patent
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Jun 30, 1998
Issued Date -
N/A
app pub date -
Apr 10, 1996
filing date -
Jan 27, 1995
priority date (Note) -
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Abstract
A method is provided for inhibiting stiction of suspended microstructures during post-release-etch rinsing and drying. The microstructures are shaped to include additional convex corners at regions of the released portion of the microstructure that can undergo substantial displacement toward the substrate. A stiction-inhibition method also includes incorporating clefts between the microstructure and adjacent field regions at regions of the microstructure which cannot undergo substantial displacement toward the substrate. Methods for inhibiting stiction are also provided wherein high-temperature rinse liquid is used and wherein a high-temperature anneal follows a rinsing step.
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