Exposure mask, method of producing the same, exposure mask producing apparatus, and method of forming surface profile on material using exposure mask
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United States of America Patent
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Jul 7, 1998
Grant Date -
N/A
app pub date -
Apr 8, 1996
filing date -
Feb 18, 1994
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A two-dimensional shape of a dotted pattern and optical densities of dots or sizes of dots having the same optical density are calculated as write data on the basis of a target distribution of transmittance. The dotted pattern is optically written on a photosensitive medium in accordance with the calculated write data, using a beam from a light source whose output is stepwise or sequentially variable. A latent dotted pattern on the photosensitive medium is developed, thereby obtaining an exposure mask having a desired two-dimensional distribution of transmittance expressed by the dotted pattern and the optical densities of dots or the sizes of dots having the same optical density.
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