Non-corrosive cleaning composition for removing plasma etching residues
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United States of America Patent
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Jul 14, 1998
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app pub date -
Sep 6, 1996
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Sep 6, 1996
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Abstract
A non-corrosive cleaning composition for removing plasma etching residues having a pH from 2 to 6 and comprising: (A) water; (B) at least one selected hydroxylammonium compound; and (C) at least one basic compound; and optionally (D) a chelating stabilizer; and optionally (E) a surfactant.
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