Process for forming fluorinated resin or amorphous carbon layer and devices containing same
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United States of America Patent
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Jul 14, 1998
Issued Date -
N/A
app pub date -
Nov 4, 1996
filing date -
Aug 21, 1992
priority date (Note) -
Expired
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Abstract
A resin or amorphous carbon layer is coated on a substrate and then fluorinated by exposing it in a F.sub.2 gas atmosphere. The thus fluorinated resin or amorphous carbon layer can be excellent in dielectric constant and thermal resistance. The resin may be photo-sensitive so that the resin can be patterned before the fluorination. Alternatively, the resin can be fluorinated before patterning.
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