Process simulation apparatus and method for selecting an optimum simulation model for a semiconductor manufacturing process

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5787269
SERIAL NO

08531231

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Abstract

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A process simulation apparatus simulates a manufacturing process of a semiconductor device which manufacturing process comprising various processes including an ion implantation process and a diffusion process. Process sequence data which represents conditions of a two-dimensional simulation for each process is input to a memory unit. The memory unit stores the process sequence data and also stores condition information for various simulation models usable for each process. An optimum simulation model for each process is selected for performing a two-dimensional simulation for each process. The semiconductor device manufacturing process is simulated by a two-dimensional simulation method using the selected optimum simulation model.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
RICOH COMPANY, LTD.TOKYO16942

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hyodo, Toshihiro Ikeda, JP 3 92

Cited Art Landscape

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