US Patent No: 5,787,269

Number of patents in Portfolio can not be more than 2000

Process simulation apparatus and method for selecting an optimum simulation model for a semiconductor manufacturing process

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Abstract

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A process simulation apparatus simulates a manufacturing process of a semiconductor device which manufacturing process comprising various processes including an ion implantation process and a diffusion process. Process sequence data which represents conditions of a two-dimensional simulation for each process is input to a memory unit. The memory unit stores the process sequence data and also stores condition information for various simulation models usable for each process. An optimum simulation model for each process is selected for performing a two-dimensional simulation for each process. The semiconductor device manufacturing process is simulated by a two-dimensional simulation method using the selected optimum simulation model.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
RICOH COMPANY, LTD.TOKYO17709

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hyodo, Toshihiro Ikeda, JP 3 92

Cited Art Landscape

Patent Info (Count) # Cites Year
 
ADVANCED MICRO DEVICES, INC. (1)
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5,416,729 Generalized solids modeling for three-dimensional topography simulation 57 1994
 
Other [Check patent profile for assignment information] (1)
4,796,194 Real world modeling and control process 180 1986

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