Method and apparatus for degassing processing solution for substrates
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United States of America Patent
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Aug 4, 1998
Grant Date -
N/A
app pub date -
Dec 6, 1996
filing date -
Dec 11, 1995
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention provides a degassing apparatus having a temperature regulating function. The degassing apparatus includes a number of gas permeating tubes for enabling a processing solution to flow through one of the two flow paths partitioned by gas permeating membranes that allow permeation of a gas but prevent permeation of a liquid, while enabling warm water to flow through the other flow path. A temperature regulator regulates the temperature of the warm water fed to the gas permeating tubes, and a gas suction pump sucks the gas from the warm water.
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