Simple repair method for phase shifting masks
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United States of America Patent
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Aug 18, 1998
Grant Date -
N/A
app pub date -
Jan 14, 1997
filing date -
Jan 14, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method and apparatus for correcting defects in a phase shift mask to be used in photolithography. More specifically, the method of the invention includes creating a second repair mask which contains phase shifters. Regions surrounding the defects on the first mask are made opaque. The design circuitry located in these defective regions is copied onto the second mask. During a second exposure the design circuitry is placed onto the semiconductor wafer. Therefore, this method and apparatus provides an inexpensive solution to a difficult problem.
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